Invention Grant
- Patent Title: Inline inspection of the contact between conductive traces and substrate for hidden defects using white light interferometer with tilted objective lens
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Application No.: US15146812Application Date: 2016-05-04
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Publication No.: US09746428B2Publication Date: 2017-08-29
- Inventor: Shuhong Liu , Zhiyong Wang , Nilanjan Z. Ghosh , Deepak Goyal
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt P.C.
- Main IPC: G01B11/02
- IPC: G01B11/02 ; G01N21/95 ; G01B9/02 ; G01B11/06 ; G01N21/956 ; G02B21/00

Abstract:
Embodiments include devices, systems and processes for using a white light interferometer (WLI) microscope with a tilted objective lens to perform in-line monitoring of both resist footing defects and conductive trace undercut defects. The defects may be detected at the interface between dry film resist (DFR) footings and conductive trace footing found on insulating layer top surfaces of a packaging substrate. Such footing and undercut defects may other wise be considered “hidden defects”. Using the WLI microscope with a tilted objective lens provides a high-throughput and low cost metrology and tool for non-destructive, non-contact, in-line monitoring.
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