- 专利标题: Structures for registration error compensation
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申请号: US14561868申请日: 2014-12-05
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公开(公告)号: US09748620B2公开(公告)日: 2017-08-29
- 发明人: Edward A. Richley , Sifen Luo
- 申请人: ZIH Corp.
- 申请人地址: US IL Lincolnshire
- 专利权人: ZIH Corp.
- 当前专利权人: ZIH Corp.
- 当前专利权人地址: US IL Lincolnshire
- 主分类号: H01P1/20
- IPC分类号: H01P1/20 ; H01P11/00 ; H01P1/203 ; H01P7/08
摘要:
Metallization layer structures for reduced changes in radio frequency characteristics due to registration error and associated methods are provided herein. An example resonator includes a first conductive layer defining an error limiting feature and a second conductive layer. The resonator further includes at least one communication feature configured to electrically couple the first conductive layer and the second conductive layer at a communication position. The error limiting feature is configured to reduce changes in radio frequency characteristics of the resonator due to registration error. Methods of manufacturing resonators are also provided herein.
公开/授权文献
- US20150091670A1 STRUCTURES FOR REGISTRATION ERROR COMPENSATION 公开/授权日:2015-04-02
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