Invention Grant
- Patent Title: Apparatus for substrate double-surface hole-filling
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Application No.: US13968354Application Date: 2013-08-15
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Publication No.: US09751104B2Publication Date: 2017-09-05
- Inventor: Sheng Zhang , Yulong Gao
- Applicant: NANCHANG O-FILM TECH CO., LTD , SUZHOU O-FILM TECH CO., LTD. , SHENZHEN O-FILM TECH CO., LTD.
- Applicant Address: CN Nanchang CN Shenzhen CN Suzhou
- Assignee: Nanchang O-Film Tech Co., Ltd.,Shenzhen O-Film Tech Co., Ltd.,Suzhou O-Film Tech Co., Ltd.
- Current Assignee: Nanchang O-Film Tech Co., Ltd.,Shenzhen O-Film Tech Co., Ltd.,Suzhou O-Film Tech Co., Ltd.
- Current Assignee Address: CN Nanchang CN Shenzhen CN Suzhou
- Agency: Hodgson Russ LLP
- Priority: CN201310243869 20130619
- Main IPC: B05C9/04
- IPC: B05C9/04 ; B05C11/04 ; B05C11/10 ; B05C5/02 ; H05K3/12

Abstract:
The present invention provides a substrate double-surface hole-filling apparatus for carrying out a hole-filling operation on a substrate which has a first surface and a second surface, comprises a first feeding device, a first scraping device, a first drying device, a second feeding device, a second scraping device, a second drying device and a turnover device. The substrate double-surface hole-filling apparatus has a turnover device turning over the substrate which needs to be carried out with hole-filling operation. Therefore, the substrate double-surface hole-filling apparatus can automatically carry out the hole-filling operation on two surfaces of the substrate without manual turnover of the substrate, thus improving production efficiency.
Public/Granted literature
- US20140373776A1 APPARATUS FOR SUBSTRATE DOUBLE-SURFACE HOLE-FILLING Public/Granted day:2014-12-25
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