Invention Grant
- Patent Title: Pressure sensor and pressure sensing method
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Application No.: US14018505Application Date: 2013-09-05
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Publication No.: US09752941B2Publication Date: 2017-09-05
- Inventor: Sang-hun Jeon , Jong-jin Park , Thanh Tien Nguyen , Ji-hyun Bae , Kyung-eun Byun , Nae-eung Lee , Do-il Kim , Quang Trung Tran
- Applicant: SAMSUNG ELECTRONICS CO., LTD. , Sungkyunkwan University Foundation for Corporate Collaboration
- Applicant Address: KR Suwon-si KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.,SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.,SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION
- Current Assignee Address: KR Suwon-si KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2012-0098486 20120905
- Main IPC: G01L1/16
- IPC: G01L1/16 ; H01L29/84

Abstract:
A pressure sensor and a pressure sensing method are provided. The pressure sensor includes a substrate; a sensor thin film transistor (TFT) disposed on the substrate and including a gate insulating layer, wherein the gate insulating layer includes an organic matrix in which piezoelectric inorganic nano-particles are dispersed; a power unit configured to apply an alternating current (AC) signal to a gate of the sensor TFT; and a pressure sensing unit configured to obtain a remnant polarization value based on a drain current which is generated in response to the AC signal and detected by the sensor TFT, and to sense a pressure based on the remnant polarization value.
Public/Granted literature
- US20140060210A1 PRESSURE SENSOR AND PRESSURE SENSING METHOD Public/Granted day:2014-03-06
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