Invention Grant
- Patent Title: Inorganic passivation material, method for forming the same, and inorganic passivation protective film produced therefrom
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Application No.: US14305354Application Date: 2014-06-16
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Publication No.: US09758624B2Publication Date: 2017-09-12
- Inventor: Wei-Cheng Tang , Yun-Shan Huang , Ya-Tin Yu , Yi-Che Su , Yuung-Ching Sheen , Yuan-Chang Huang
- Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Applicant Address: TW Hsinchu
- Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: TW102149211A 20131231
- Main IPC: B05D3/00
- IPC: B05D3/00 ; C08G77/395 ; C09D183/04 ; C09D183/06 ; C09D183/08 ; C08G77/30

Abstract:
A method for forming an inorganic passivation material is provided. The method includes mixing about 5 to 80 parts by weight of trialkoxysilane, about 10 to 80 parts by weight of tetraalkoxysilane, and about 1 to 30 parts by weight of catalyst to perform a reaction at pH of about 0.05 to 4 to form an inorganic resin material. The inorganic resin material is modified by phosphate ester to form an inorganic passivation material, wherein phosphate ester is about 0.1-10 parts by weight based on 100 parts by weight of the inorganic resin material. An inorganic passivation material and a passivation protective film produced therefrom are also provided.
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