Invention Grant
- Patent Title: Brush, back surface treatment assembly and method for cleaning substrate
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Application No.: US14831502Application Date: 2015-08-20
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Publication No.: US09770092B2Publication Date: 2017-09-26
- Inventor: Kuo-Shu Tseng , Yao-Yuan Shang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: A46B13/08
- IPC: A46B13/08 ; A46B13/02 ; A46B13/00

Abstract:
A brush for back surface treatment (BST) is provided. The brush includes a base portion and a brushing portion. The brushing portion is connected to the base portion. The brushing portion has a plurality of gutters disposed on a surface away from the base portion, in which at least one of the gutters has at least one open end located at least partially on a perimeter of the surface.
Public/Granted literature
- US20170049221A1 BRUSH, BACK SURFACE TREATMENT ASSEMBLY AND METHOD FOR CLEANING SUBSTRATE Public/Granted day:2017-02-23
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