Invention Grant
- Patent Title: Apparatus and methods for combined brightfield, darkfield, and photothermal inspection
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Application No.: US14618586Application Date: 2015-02-10
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Publication No.: US09772297B2Publication Date: 2017-09-26
- Inventor: Lena Nicolaides , Mohan Mahadevan , Alex Salnik , Scott A. Young
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Kwan & Olynick LLP
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01B11/30 ; G01N21/95 ; G01N21/17 ; G01N21/88

Abstract:
Disclosed are methods and apparatus for detecting defects or reviewing defects in a semiconductor sample. The system has a brightfield (BF) module for directing a BF illumination beam onto a sample and detecting an output beam reflected from the sample in response to the BF illumination beam. The system has a modulated optical reflectance (MOR) module for directing a pump and probe beam to the sample and detecting a MOR output beam from the probe spot in response to the pump beam and the probe beam. The system includes a processor for analyzing the BF output beam from a plurality of BF spots to detect defects on a surface or near the surface of the sample and analyzing the MOR output beam from a plurality of probe spots to detect defects that are below the surface of the sample.
Public/Granted literature
- US20150226676A1 APPARATUS AND METHODS FOR COMBINED BRIGHTFIELD, DARKFIELD, AND PHOTOTHERMAL INSPECTION Public/Granted day:2015-08-13
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