Invention Grant
- Patent Title: Chemical mechanical polishing (CMP) composition comprising a protein
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Application No.: US14377648Application Date: 2013-01-25
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Publication No.: US09777192B2Publication Date: 2017-10-03
- Inventor: Yuzhuo Li , Bastian Marten Noller , Michael Lauter , Roland Lange
- Applicant: BASF SE
- Applicant Address: DE Ludwigshafen
- Assignee: BASF SE
- Current Assignee: BASF SE
- Current Assignee Address: DE Ludwigshafen
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- International Application: PCT/IB2013/050647 WO 20130125
- International Announcement: WO2013/118015 WO 20130815
- Main IPC: C09G1/02
- IPC: C09G1/02 ; H01L21/3105 ; C09K3/14 ; H01L21/306 ; C09G1/18
Abstract:
Chemical mechanical polishing composition is provided. The composition comprises (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) a protein, and (C) an aqueous medium.
Public/Granted literature
- US20150017454A1 CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION COMPRISING A PROTEIN Public/Granted day:2015-01-15
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