Invention Grant
- Patent Title: Stage system and lithographic apparatus comprising such stage system
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Application No.: US14423405Application Date: 2013-08-19
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Publication No.: US09785060B2Publication Date: 2017-10-10
- Inventor: Ruud Antonius Catharina Maria Beerens , Rob Johan Theodoor Rutten , Jan Steven Christiaan Westerlaken , Koen Jacobus Johannes Maria Zaal , Richard Henricus Adrianus Van Lieshout , Engelbertus Antonius Fransiscus Van Der Pasch
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pilsbury Winthrop Shaw Pittman LLP
- International Application: PCT/EP2013/067253 WO 20130819
- International Announcement: WO2014/044477 WO 20140327
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01D5/38 ; G01D5/34

Abstract:
A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.
Public/Granted literature
- US20150227060A1 STAGE SYSTEM AND LITHOGRAPHIC APPARATUS COMPRISING SUCH STAGE SYSTEM Public/Granted day:2015-08-13
Information query
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