- Patent Title: Sensor apparatus for analyzing a gas mixture in a process chamber
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Application No.: US14749682Application Date: 2015-06-25
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Publication No.: US09791426B2Publication Date: 2017-10-17
- Inventor: Gerit Ebelsberger , Holger Hackstein , Erhard Magori
- Applicant: SIEMENS AKTIENGESELLSCHAFT
- Applicant Address: DE
- Assignee: SIEMENS AKTIENGESELLSCHAFT
- Current Assignee: SIEMENS AKTIENGESELLSCHAFT
- Current Assignee Address: DE
- Agency: Schmeiser Olsen & Watts LLP
- Priority: DE202014005420U 20140702
- Main IPC: G01N33/00
- IPC: G01N33/00 ; G01N1/22 ; F23R3/00

Abstract:
A sensor apparatus for analyzing a gas in a process chamber, having a housing, a gas sensor for analyzing at least a part of the gas, the gas sensor being arranged at a determined position in the housing, a gas feed for connecting the housing to the process chamber to feed the part of the gas from the process chamber into the housing and to the determined position, and a gas discharge for discharging the gas from the housing, wherein the gas feed and the gas discharge are configured as tubes lying inside one another, characterized by a closure cap at the combustion chamber-side end of the tubes lying inside one another, the closure cap including an even number of at least four openings with the same area, which are connected alternately as a gas inlet and a gas outlet to the tubes lying inside one another is provided.
Public/Granted literature
- US20160003789A1 SENSOR APPARATUS FOR ANALYZING A GAS MIXTURE IN A PROCESS CHAMBER Public/Granted day:2016-01-07
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