Invention Grant
- Patent Title: Method for structuring a substrate using a protection layer as a mask
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Application No.: US15347835Application Date: 2016-11-10
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Publication No.: US09793119B2Publication Date: 2017-10-17
- Inventor: Martin Mischitz , Markus Heinrici , Florian Bernsteiner
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee Address: DE Neubiberg
- Agency: Viering, Jentschura & Partner mbB
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/027 ; H01L21/308 ; H01L21/306 ; H01L21/3065 ; H01L21/02

Abstract:
According to various embodiments, a method of processing a substrate may include: disposing a viscous material over a substrate including at least one topography feature extending into the substrate to form a protection layer over the substrate; adjusting a viscosity of the viscous material during a contacting period of the viscous material and the substrate to stabilize a spatial distribution of the viscous material as disposed; processing the substrate using the protection layer as mask; and removing the protection layer after processing the substrate.
Public/Granted literature
- US20170154767A1 METHOD FOR STRUCTURING A SUBSTRATE Public/Granted day:2017-06-01
Information query
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