Invention Grant
- Patent Title: Lithographic apparatus for measuring overlay error and a device manufacturing method
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Application No.: US15264152Application Date: 2016-09-13
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Publication No.: US09798250B2Publication Date: 2017-10-24
- Inventor: Marcus Adrianus Van De Kerkhof , Leonardus Henricus Marie Verstappen
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G06K9/62
- IPC: G06K9/62 ; G03F7/20
Abstract:
A lithographic apparatus including an inspection apparatus can measure the overlay error of a target in a scribelane is measured. The overlay error of the required feature in the chip area may differ from this due to, for example, different responses to the exposure process. A model is used to simulate these differences and thus a more accurate measurement of the overlay error of the feature determined.
Public/Granted literature
- US20160377992A1 Lithographic Apparatus for Measuring Overlay Error and a Device Manufacturing Method Public/Granted day:2016-12-29
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