- 专利标题: Method of manufacturing silicon carbide single crystal and silicon carbide single crystal substrate
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申请号: US15017235申请日: 2016-02-05
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公开(公告)号: US09799735B2公开(公告)日: 2017-10-24
- 发明人: Tsubasa Honke , Kyoko Okita , Tomohiro Kawase , Tsutomu Hori
- 申请人: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- 申请人地址: JP Osaka-shi, Osaka
- 专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人: Sumitomo Electric Industries, Ltd.
- 当前专利权人地址: JP Osaka-shi, Osaka
- 代理机构: Drinker Biddle & Reath LLP
- 优先权: JP2013-139782 20130703
- 主分类号: B32B3/00
- IPC分类号: B32B3/00 ; H01L29/16 ; C30B23/00 ; C30B29/36 ; C30B23/02 ; C30B23/06 ; H01L29/04
摘要:
Quality of a silicon carbide single crystal is improved. A crucible having first and second sides is prepared. A solid source material for growing silicon carbide with a sublimation method is arranged on the first side. A seed crystal made of silicon carbide is arranged on the second side. The crucible is arranged in a heat insulating container. The heat insulating container has an opening facing the second side. The crucible is heated such that the solid source material sublimes. A temperature on the second side is measured through the opening in the heat insulating container. The opening has a tapered inner surface narrowed toward the outside of the heat insulating container.
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