Invention Grant
- Patent Title: Plasma source
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Application No.: US14765817Application Date: 2013-02-06
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Publication No.: US09805918B2Publication Date: 2017-10-31
- Inventor: Florin Daniel Duminica , Vincent LeClercq , Eric Silberberg , Alain Daniel
- Applicant: ARCELORMITTAL INVESTIGACIÓN Y DESARROLLO SL
- Applicant Address: ES Sestao
- Assignee: ARCELORMITTAL INVESTIGACIÓN Y DESARROLLO SL
- Current Assignee: ARCELORMITTAL INVESTIGACIÓN Y DESARROLLO SL
- Current Assignee Address: ES Sestao
- Agency: Christensen O'Connor Johnson
- Agent Laura Cruz; John Denkenberger
- International Application: PCT/EP2013/052340 WO 20130206
- International Announcement: WO2014/121831 WO 20140814
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H05H1/46 ; C23C16/50

Abstract:
The invention relates to a plasma source (1) for depositing a coating onto a substrate (9), which is connectable to a power source (P) and includes: an electrode (2); a magnetic assembly (4) located circumferentially relative to said electrode and including a set of magnets mutually connected by a magnetic bracket (46) including a first and second central magnet (43, 44) and at least one head magnet (45); and an electrically insulating enclosure (5) arranged such as to surround the electrode and the magnets.
Public/Granted literature
- US20160005575A1 PLASMA SOURCE Public/Granted day:2016-01-07
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