- 专利标题: Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
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申请号: US15095500申请日: 2016-04-11
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公开(公告)号: US09810999B2公开(公告)日: 2017-11-07
- 发明人: Yuichi Shibazaki
- 申请人: NIKON CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: NIKON CORPORATION
- 当前专利权人: NIKON CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff PLC
- 主分类号: G03B27/52
- IPC分类号: G03B27/52 ; G03B27/42 ; G03F7/20
摘要:
A liquid immersion member forms a liquid immersion space on an object movable below an optical member so that a light path of exposure light emitted from an emission surface of the optical member is filled with liquid. The liquid immersion member includes a first member which is disposed in at least a portion of a periphery of the optical member, a second member which is movable relative to the first member and which includes a recovery port that recovers at least a portion of the liquid in the liquid immersion space, and a gas supply opening facing a gap between the first member and the second member, from which gas is supplied to the gap.
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