Invention Grant
- Patent Title: Photolithography tool and method thereof
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Application No.: US14929098Application Date: 2015-10-30
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Publication No.: US09811000B2Publication Date: 2017-11-07
- Inventor: Chia-Feng Liao , Chun-Hsien Lin , Pei-Yi Su , Yi-Ming Dai , Chung-Hsing Lee , Chien-Ko Liao , Chun-Yung Chang , Nan-Jung Chen , Pei-Yuan Wu , Hsien-Mao Huang
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Maschoff Brennan
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03F7/20 ; G01N21/88 ; G01N21/95
Abstract:
A photolithography tool includes at least one process chamber, at least one front opening unified pod (FOUP) stage, at least one moving mechanism, and an image sensor. The moving mechanism is configured to move the wafer from the process chamber to the FOUP stage. The image sensor is configured to capture the image of the wafer on the moving mechanism.
Public/Granted literature
- US20170123328A1 PHOTOLITHOGRAPHY TOOL AND METHOD THEREOF Public/Granted day:2017-05-04
Information query
