Invention Grant
- Patent Title: Lithographic method and apparatus
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Application No.: US15032245Application Date: 2014-10-02
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Publication No.: US09817320B2Publication Date: 2017-11-14
- Inventor: Jaqueline Borges Nicolau , Hannah Noble , Johannes Jacobus Matheus Baselmans , Bart Smeets , Paulus Jacobus Maria Van Adrichem
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2014/071182 WO 20141002
- International Announcement: WO2015/074796 WO 20150528
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G06T5/00

Abstract:
A method of correcting an optical image formed by an optical system, the method including obtaining a map indicative of a polarization dependent property of the optical system across a pupil plane of the optical system for each spatial position in an image plane of the optical system, combining the map indicative of the polarization dependent property of the optical system with a radiation map of the intensity and polarization of an input radiation beam to form an image map, and using the image map to correct an optical image formed by directing the input radiation beam through the optical system.
Public/Granted literature
- US20160274462A1 Lithographic Method and Apparatus Public/Granted day:2016-09-22
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