- 专利标题: Conductive pattern formation method, conductive pattern-bearing substrate, and touch panel sensor
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申请号: US15144850申请日: 2016-05-03
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公开(公告)号: US09817499B2公开(公告)日: 2017-11-14
- 发明人: Hiroshi Yamazaki , Yoshimi Igarashi
- 申请人: Hitachi Chemical Company, Ltd.
- 申请人地址: JP Tokyo
- 专利权人: HITACHI CHEMICAL COMPANY, LTD.
- 当前专利权人: HITACHI CHEMICAL COMPANY, LTD.
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitch, Even, Tabin & Flannery LLP
- 优先权: JP2011-219176 20111003
- 主分类号: G06F3/041
- IPC分类号: G06F3/041 ; H05K1/09 ; H05K3/06 ; G06F3/044 ; G03F7/027 ; G03F7/09 ; G03F7/095 ; G03F7/20 ; G03F7/00 ; H05K1/03 ; H05K1/02
摘要:
A conductive pattern formation method of the present invention includes a first exposure step of radiating active light in a patterned manner to a photosensitive layer including a photosensitive resin layer provided on a substrate and a conductive film provided on a surface of the photosensitive resin layer on a side opposite to the substrate; a second exposure step of radiating active light, in the presence of oxygen, to some or all of the portions of the photosensitive layer not exposed at least in the first exposure step; and a development step of developing the photosensitive layer to form a conductive pattern following the second exposure step.