Invention Grant
- Patent Title: Method of removing particulate silicon from an effluent water
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Application No.: US14470998Application Date: 2014-08-28
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Publication No.: US09828263B2Publication Date: 2017-11-28
- Inventor: Friedrich Kroener , Zeljka Kroener
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee: INFINEON TECHNOLOGIES AG
- Current Assignee Address: DE Neubiberg
- Agency: Viering, Jentschura & Partner mbB
- Main IPC: C02F1/52
- IPC: C02F1/52 ; C02F101/10 ; C02F103/34 ; C02F1/72

Abstract:
A method of removing particulate silicon from an effluent water in accordance with various embodiments may include: adding a base to the effluent water, an amount of the added base being sub-stoichiometric with regard to a basic oxidation reaction of an entire amount of silicon contained in the effluent water to ortho-silicic acid or ortho-silicate ions; maintaining a resulting mixture of the effluent water and the base in a predetermined temperature range for a period of time, so that a sediment including silicon is formed; and separating the sediment and the effluent water from each other.
Public/Granted literature
- US20160060144A1 METHOD OF REMOVING PARTICULATE SILICON FROM AN EFFLUENT WATER Public/Granted day:2016-03-03
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