Invention Grant
- Patent Title: Refractory seed metal for electroplated MEMS structures
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Application No.: US14844132Application Date: 2015-09-03
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Publication No.: US09845235B2Publication Date: 2017-12-19
- Inventor: Joleyn Eileen Brewer , Christopher Fred Keimel , Marco Francesco Aimi , Andrew Minnick , Renner Stephen Ruffalo
- Applicant: General Electric Company
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Agency: Ziolkowski Patent Solutions Group, SC
- Agent Jean K. Testa
- Main IPC: B81B3/00
- IPC: B81B3/00 ; H01L29/84 ; B81C1/00 ; G01L9/00 ; B81B7/00

Abstract:
A system and method for a micro-electrical-mechanical system (MEMS) device including a substrate and a free-standing and suspended electroplated metal MEMS structure formed on the substrate. The free-standing and suspended electroplated metal MEMS structure includes a metal mechanical element mechanically coupled to the substrate and a seed layer mechanically coupled to and in electrical communication with the mechanical element, the seed layer comprising at least one of a refractory metal and a refractory metal alloy, wherein a thickness of the mechanical element is substantially greater than a thickness of the seed layer such that the mechanical and electrical properties of the free-standing and suspended electroplated metal MEMS structure are defined by the material properties of the mechanical element.
Public/Granted literature
- US20170066645A1 REFRACTORY SEED METAL FOR ELECTROPLATED MEMS STRUCTURES Public/Granted day:2017-03-09
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