- 专利标题: Apparatus and process for atomic or molecular layer deposition onto particles during pneumatic transport
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申请号: US13254854申请日: 2010-03-04
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公开(公告)号: US09845532B2公开(公告)日: 2017-12-19
- 发明人: Jan Rudolf Van Ommen
- 申请人: Jan Rudolf Van Ommen
- 申请人地址: NL Delft
- 专利权人: Delft University of Technology
- 当前专利权人: Delft University of Technology
- 当前专利权人地址: NL Delft
- 代理机构: Foley & Lardner LLP
- 优先权: NL2002590 20090304
- 国际申请: PCT/EP2010/052769 WO 20100304
- 国际公布: WO2010/100235 WO 20100910
- 主分类号: C23C16/44
- IPC分类号: C23C16/44 ; C23C16/455
摘要:
The invention provides a process for depositing a coating onto particles being pneumatically transported in a tube. The process comprising the steps of providing a tube having an inlet opening and an outlet opening; feeding a carrier gas entraining particles into the tube at or near the inlet opening of the tube to create a particle flow through the tube; and injecting a first self-terminating reactant into the tube via at least one injection point downstream from the inlet opening of the tube for reaction with the particles in the particle flow. The process is suitable for atomic layer deposition and molecular layer deposition. An apparatus for carrying out the process is also disclosed.
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