发明授权
- 专利标题: Imprint apparatus
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申请号: US14372938申请日: 2013-01-25
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公开(公告)号: US09851634B2公开(公告)日: 2017-12-26
- 发明人: Yozo Matsuda , Noriyasu Hasegawa , Mitsuru Hiura , Tatsuya Hayashi
- 申请人: CANON KABUSHIKI KAISHA
- 申请人地址: JP Tokyo
- 专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人: CANON KABUSHIKI KAISHA
- 当前专利权人地址: JP Tokyo
- 代理机构: Rossi, Kimms & McDowell LLP
- 优先权: JP2012-015558 20120127; JP2013-006827 20130118
- 国际申请: PCT/JP2013/000400 WO 20130125
- 国际公布: WO2013/111606 WO 20130801
- 主分类号: G03F7/00
- IPC分类号: G03F7/00 ; G03F9/00 ; B82Y10/00 ; B82Y40/00 ; B29C59/00 ; B29C59/16 ; B29C59/02
摘要:
An imprint apparatus forms a pattern of a resin on a region to be processed of a substrate using a mold including a pattern region on which a pattern is formed and includes a correction unit configured to correct a shape of a target region that is either the pattern region on the mold or the region to be processed on the substrate, wherein the correction unit further includes: a heating unit configured to heat an object corresponding to the target region of either the mold or the substrate in a heating region having an area smaller than that of the pattern region on the mold; a scanning unit configured to scan the heating region with respect to the target region by changing the relative position of the target region and the heating region; and a control unit configured to acquire information regarding a correction deformation amount of the target region and control the heating unit and the scanning unit based on the information.