Invention Grant
- Patent Title: Manufacturing method of array substrate, array substrate and display device
-
Application No.: US14436995Application Date: 2014-08-20
-
Publication No.: US09859304B2Publication Date: 2018-01-02
- Inventor: Shuang Sun , Fangzhen Zhang , Jing Niu
- Applicant: BOE TECHNOLOGY GROUP CO., LTD.
- Applicant Address: CN Beijing
- Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee: BOE TECHNOLOGY GROUP CO., LTD.
- Current Assignee Address: CN Beijing
- Agency: Nath, Goldberg & Meyer
- Agent Joshua B. Goldberg
- Priority: CN201410129376 20140401
- International Application: PCT/CN2014/084819 WO 20140820
- International Announcement: WO2015/149469 WO 20151008
- Main IPC: H01L21/44
- IPC: H01L21/44 ; H01L27/12 ; G02F1/1339 ; G02F1/1343 ; G02F1/1362 ; G02F1/1368 ; H01L21/027 ; H01L21/3213 ; H01L21/4763 ; H01L29/66 ; H01L29/786

Abstract:
The present invention provides an array substrate and a manufacturing method thereof and a display device. The manufacturing method comprises: forming a pattern including a pixel electrode and a source of a thin film transistor on a base substrate through a single patterning process, the pixel electrode is provided in a layer under a layer in which the source is located; forming a pattern including a drain, an active layer, a gate insulation layer and a gate of the thin film transistor through a single patterning process, the active layer covers the source and the drain, and is separated from the gate through the gate insulation layer; and forming a pattern including a passivation layer, a common electrode and a gate line through a single patterning process, the common electrode is a slit electrode and separated from the active layer and the pixel electrode through the passivation layer.
Public/Granted literature
- US20160148954A1 MANUFACTURING METHOD OF ARRAY SUBSTRATE, ARRAY SUBSTRATE AND DISPLAY DEVICE Public/Granted day:2016-05-26
Information query
IPC分类: