- 专利标题： Method for manufacturing stretchable wire and method for manufacturing stretchable integrated circuit
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申请号： US15220145申请日： 2016-07-26
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公开(公告)号： US09865559B2公开(公告)日： 2018-01-09
- 发明人: Chan Woo Park , Jae Bon Koo , Bock Soon Na , Rae-Man Park , Ji-Young Oh , Sang Seok Lee , Soon-Won Jung
- 申请人： ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- 申请人地址： KR Daejeon
- 专利权人： ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- 当前专利权人： ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- 当前专利权人地址： KR Daejeon
- 代理机构： Rabin & Berdo, P.C.
- 优先权： KR10-2015-0118196 20150821; KR10-2016-0008220 20160122
- 主分类号： H01L23/00
- IPC分类号： H01L23/00 ; H01L21/683
摘要：
Provided is a method for manufacturing a stretchable wire, the method including removing a portion of a photoresist layer on a substrate to form a photoresist pattern comprising at least one pattern slit, applying a liquid-phase conductive material on the photoresist pattern to form a liquid-phase conductive structure in the pattern slit, forming a stretchable first insulating layer on the liquid-phase conductive structure, after removing the photoresist pattern, and separating the liquid-phase conductive structure and the first insulating layer from the substrate.
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