Invention Grant
- Patent Title: System and method for controlling ion implanter
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Application No.: US14099672Application Date: 2013-12-06
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Publication No.: US09870896B2Publication Date: 2018-01-16
- Inventor: Po-Feng Tsai , Chia-Tong Ho , Chia-Hsing Liao , Sheng-Wei Lee , Jo-Fei Wang , Jong-I Mou
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: McDermott Will & Emery LLP
- Main IPC: H01J37/317
- IPC: H01J37/317 ; H01J37/304

Abstract:
A system, a method, and a non-transitory computer readable storage medium for controlling an ion implanter are disclosed herein. The system includes a sample module and a control module. The sample module is configured to generate a summarized value from process data of the ion implanter, and the process data correspond to a control parameter. The control module is configured to tune a control parameter, and the control module performs an ion implantation by releasing tools of the ion implanter in accordance with the control parameter when the summarized value meets a predetermined stability requirement.
Public/Granted literature
- US20150162166A1 SYSTEM AND METHOD FOR CONTROLLING ION IMPLANTER Public/Granted day:2015-06-11
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