- 专利标题: Light source apparatus and projector
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申请号: US15040145申请日: 2016-02-10
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公开(公告)号: US09876998B2公开(公告)日: 2018-01-23
- 发明人: Kiyoshi Kuroi , Akira Egawa
- 申请人: SEIKO EPSON CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: SEIKO EPSON CORPORATION
- 当前专利权人: SEIKO EPSON CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff PLC
- 优先权: JP2015-028781 20150217
- 主分类号: G03B21/20
- IPC分类号: G03B21/20 ; H04N9/31 ; G02B26/00 ; G02B27/09 ; G02B27/10 ; G03B21/22
摘要:
A light source apparatus includes a light source, a substrate provided rotatably around a predetermined axis of rotation, a scattered light generator which is provided on the substrate and on which light from the light source is incident, a pickup lens provided on the light exiting side of the scattered light generator, and a holding member that holds the pickup lens, and at least one of the contour of a surface closest to the substrate among the surfaces of the holding member and the contour of a surface facing the substrate among the surfaces of the pickup lens is located inside the contour of the substrate when viewed in the direction parallel to the axis of rotation.
公开/授权文献
- US20160241821A1 LIGHT SOURCE APPARATUS AND PROJECTOR 公开/授权日:2016-08-18
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