A method of fabricating an array substrate for a liquid crystal display device can include forming a gate line and a gate electrode, and a gate insulating layer; forming an active layer on the gate insulating layer and an ohmic contact layer on the active layer; forming a data line and source and drain electrodes; forming a passivation layer on the source and drain electrodes; and forming a pixel electrode on the passivation layer, in which the ohmic contact layer covers an entire top surface of the active layer between the source and drain electrodes; forming a metallic layer on the gate insulating layer and the ohmic contact layer; etching the metallic layer to faun the data line, and the source drain electrodes, in which a silicide layer is formed on the ohmic contact layer only in the space between the source and drain electrodes; and removing the silicide layer.