Invention Grant
- Patent Title: Phase shift mask, method for manufacturing the same, and method for forming micro pattern
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Application No.: US14691530Application Date: 2015-04-20
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Publication No.: US09885950B2Publication Date: 2018-02-06
- Inventor: Yong Son , Min Kang , Bong Yeon Kim , Hyun Joo Lee , Jin Ho Ju
- Applicant: Samsung Display Co., Ltd.
- Applicant Address: KR Yongin-si
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin-si
- Agency: H.C. Park & Associates, PLC
- Priority: KR10-2014-0177484 20141210
- Main IPC: G03F1/26
- IPC: G03F1/26 ; G03F1/34 ; G03F1/54 ; G03F1/32

Abstract:
A phase shift mask enables much smaller scale of electronic circuit pattern. A phase shift mask comprises a transparent substrate, a phase shift pattern arranged on the transparent substrate to change a phase of light that penetrates the transparent substrate, and a metal coating layer arranged on at least a part of a surface of the phase shift pattern.
Public/Granted literature
- US20160170294A1 PHASE SHIFT MASK, METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR FORMING MICRO PATTERN Public/Granted day:2016-06-16
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