Invention Grant
- Patent Title: System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
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Application No.: US15003385Application Date: 2016-01-21
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Publication No.: US09888554B2Publication Date: 2018-02-06
- Inventor: Jonghoon Baek , Mathew Cheeran Abraham , David Robert Evans , Jack Michael Gazza
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Marine Penilla Group, LLP
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G03F7/20 ; G02B19/00
Abstract:
A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.
Public/Granted literature
- US20170215265A1 System, Method and Apparatus for Target Material Debris Cleaning of EUV Vessel and EUV Collector Public/Granted day:2017-07-27
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