- 专利标题: Profile measuring apparatus, structure manufacturing system, method for measuring profile, method for manufacturing structure, and non-transitory computer readable medium
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申请号: US13688873申请日: 2012-11-29
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公开(公告)号: US09897437B2公开(公告)日: 2018-02-20
- 发明人: Masaya Yamaguchi
- 申请人: NIKON CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: NIKON CORPORATION
- 当前专利权人: NIKON CORPORATION
- 当前专利权人地址: JP Tokyo
- 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- 优先权: JP2011-262838 20111130
- 主分类号: G01B11/00
- IPC分类号: G01B11/00 ; G01B11/24 ; H04N7/18 ; B23Q17/24
摘要:
There is provided a profile measuring apparatus, including: an irradiation section configured to irradiate a measurement light to a measurement area of the object; an imaging section configured to obtain an image of the measurement area; a table configured to place the object thereon; a coordinate calculation section configured to calculate a position of the measurement area based on an image detected by a detection section; and a positioning mechanism configured to drive and control a relative position of the imaging section and the table. The positioning mechanism calculates a relative position of the imaging section to the table, based on an information with respect to an edge line direction of a convex portion or an extending direction of a concave portion in the measurement area of the object having a repetitive concave-convex shape, to move at least one of the table and the imaging section.
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