- Patent Title: Patterning device manipulating system and lithographic apparatuses
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Application No.: US14437294Application Date: 2013-09-20
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Publication No.: US09910368B2Publication Date: 2018-03-06
- Inventor: Christiaan Louis Valentin , Erik Roelof Loopstra , Christopher Charles Ward , Daniel Nathan Burbank , Mark Josef Schuster , Peter James Graffeo
- Applicant: ASML Netherlands B.V. , ASML Holding N.V.
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee: ASML Netherlands B.V.,ASML Holding N.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2013/069547 WO 20130920
- International Announcement: WO2014/063871 WO 20140501
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A system (300) for supporting an exchangeable object (302) can include a movable structure (304) and an object holder (306) configured to be movable relative to the movable structure. The object holder can be configured to hold the exchangeable object. The system can also include a first actuator assembly (308) and second actuator assembly (316). The first actuator assembly can be configured to apply a force to the object holder to translate the exchangeable object generally along a plane. The second actuator assembly can be configured to apply a bending moment to the object holder. The exchangeable object can be a patterning device of a lithographic apparatus.
Public/Granted literature
- US20150277241A1 Patterning Device Manipulating System and Lithographic Apparatuses Public/Granted day:2015-10-01
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