Invention Grant
- Patent Title: Semiconductor device comprising a field effect transistor and method of manufacturing the semiconductor device
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Application No.: US15437932Application Date: 2017-02-21
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Publication No.: US09917163B2Publication Date: 2018-03-13
- Inventor: Andreas Meiser , Till Schloesser
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Baker Botts L.L.P.
- Priority: DE102015106683 20150429
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L27/15 ; H01L29/417 ; H01L29/10 ; H01L29/66 ; H01L29/40

Abstract:
A semiconductor device comprises a field effect transistor in a semiconductor substrate having a first main surface. The field effect transistor comprises a source region, a drain region, a body region, and a gate electrode at the body region. The gate electrode is configured to control a conductivity of a channel formed in the body region, and the gate electrode is disposed in gate trenches. The body region is disposed along a first direction between the source region and the drain region, the first direction being parallel to the first main surface. The body region has a shape of a ridge extending along the first direction, the body region being adjacent to the source region and the drain region. The semiconductor device further comprises a source contact and a body contact, the source contact being electrically connected to a source terminal, the body contact being electrically connected to the source contact and to the body region.
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Information query
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