Invention Grant
- Patent Title: Focus monitoring arrangement and inspection apparatus including such an arrangement
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Application No.: US14867594Application Date: 2015-09-28
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Publication No.: US09921489B2Publication Date: 2018-03-20
- Inventor: Amandev Singh , Henricus Petrus Maria Pellemans
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Priority: EP14187646 20141003
- Main IPC: G01B9/00
- IPC: G01B9/00 ; G03F7/20 ; G03F9/00 ; G02B21/24

Abstract:
An inspection apparatus (300) includes a focus monitoring arrangement (500, 500′). Focusing radiation (505) comprises radiation having a first wavelength and radiation having a second wavelength. Reference radiation and focusing radiation at each wavelength are provided with at least one relative frequency shift so that the interfering radiation detected in the detection system includes a time-varying component having a characteristic frequency. A focus detection system (520) comprises one or more lock-in detectors (520b, 520c, 900). Operating the lock-in detectors with reference to both the first and second characteristic frequencies allows the arrangement to select which of the first and second focusing radiation is used to determine whether the optical system is in focus. Good quality signals can be obtained from targets of different structure.
Public/Granted literature
- US20160097984A1 Focus Monitoring Arrangement and Inspection Apparatus Including such an Arrangement Public/Granted day:2016-04-07
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