Invention Grant
- Patent Title: Method for transferring a useful layer
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Application No.: US15018465Application Date: 2016-02-08
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Publication No.: US09922867B2Publication Date: 2018-03-20
- Inventor: Didier Landru , Oleg Kononchuk , Nadia Ben Mohamed
- Applicant: Soitec
- Applicant Address: FR Bernin
- Assignee: Soitec
- Current Assignee: Soitec
- Current Assignee Address: FR Bernin
- Agency: TraskBritt
- Priority: FR1551046 20150210
- Main IPC: H01L21/324
- IPC: H01L21/324 ; H01L21/762 ; H01L21/265

Abstract:
A method for transferring a useful layer onto a carrier substrate comprises formation of an embrittlement plane by implantation of light species into a first substrate in such a manner as to define the bounds of a useful layer between the plane and a surface of the first substrate, mounting of the carrier substrate onto a surface of the first substrate so as to form an assembly to be fractured, and thermal fracture treatment of the first substrate along the embrittlement plane in such a manner as to transfer the useful layer onto a support. During the thermal fracture treatment, the degree of peripheral adhesion is reduced at an interface between the carrier substrate and the first substrate.
Public/Granted literature
- US20160233125A1 METHOD FOR TRANSFERRING A USEFUL LAYER Public/Granted day:2016-08-11
Information query
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