- 专利标题: Solid-state imaging device, manufacturing method of solid-state imaging device, and electronic device
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申请号: US15435476申请日: 2017-02-17
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公开(公告)号: US09923010B2公开(公告)日: 2018-03-20
- 发明人: Takeshi Yanagita , Itaru Oshiyama , Takayuki Enomoto , Harumi Ikeda , Shinichiro Izawa , Atsuhiko Yamamoto , Kazunobu Ota
- 申请人: SONY CORPORATION
- 申请人地址: JP Tokyo
- 专利权人: Sony Corporation
- 当前专利权人: Sony Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sheridan Ross P.C.
- 优先权: JP2011-045269 20110302; JP2012-011405 20120123
- 主分类号: H01L27/146
- IPC分类号: H01L27/146
摘要:
The present technology relates to a solid-state imaging device, manufacturing method of a solid-state imaging device, and an electronic device, which can provide a solid-state imaging device having further improved features such as reduced optical color mixing and the like. Also, an electronic device using the solid-state imaging device thereof is provided. According to a solid-state imaging device having a substrate and multiple photoelectric converters that are formed on the substrate, an insulating film forms an embedded element separating unit. The element separating unit is configured of an insulating film having a fixed charge that is formed so as to coat the inner wall face of a groove portion, within the groove portion which is formed in the depth direction from the light input side of the substrate.
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