Invention Grant
- Patent Title: Substrate holder and support table for lithography
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Application No.: US15111455Application Date: 2014-11-20
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Publication No.: US09939736B2Publication Date: 2018-04-10
- Inventor: Martijn Houben , Thomas Poiesz
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP14151736 20140120
- International Application: PCT/EP2014/075163 WO 20141120
- International Announcement: WO2015/106860 WO 20150723
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/687 ; H01L21/683

Abstract:
A substrate table supports a substrate holder to which a substrate is clamped for exposure. The substrate table has a plurality of e-pins spaced apart from and distributed around the center of the substrate holder to receive, and lower, a substrate onto the substrate holder prior to exposure, and to raise a substrate off the substrate holder after exposure. Tip portions of the e-pins and the corresponding apertures in the substrate holder have a shape in plan including at least one re-entrant, e.g. a cross shape.
Public/Granted literature
- US20160334710A1 SUBSTRATE HOLDER AND SUPPORT TABLE FOR LITHOGRAPHY Public/Granted day:2016-11-17
Information query
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