Invention Grant
- Patent Title: Plasma poisoning to enable selective deposition
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Application No.: US15658266Application Date: 2017-07-24
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Publication No.: US09947539B2Publication Date: 2018-04-17
- Inventor: Ludovic Godet , Srinivas D. Nemani , Tobin Kaufman-Osborn
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/263 ; H01L21/027 ; H01L21/285
Abstract:
Atomic layer deposition in selected zones of a workpiece surface is accomplished by transforming the surfaces outside the selected zones to a hydrophobic state while the materials in the selected zones remain hydrophilic.
Public/Granted literature
- US20170323778A1 PLASMA POISONING TO ENABLE SELECTIVE DEPOSITION Public/Granted day:2017-11-09
Information query
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