Invention Grant
- Patent Title: Methods for crossed-fins FinFET device for sensing and measuring magnetic fields
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Application No.: US15190323Application Date: 2016-06-23
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Publication No.: US09964605B2Publication Date: 2018-05-08
- Inventor: Min-hwa Chi , Xusheng Wu
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Dithavong & Steiner, P.C.
- Main IPC: H01L29/66
- IPC: H01L29/66 ; G01R33/06 ; H01L29/06 ; H01L29/78 ; H01L29/82

Abstract:
Methods for forming an efficient and effective crossed-fins FinFET device for sensing and measuring magnetic fields and resulting devices are disclosed. Embodiments include forming first-fins, parallel to and spaced from each other, in a first direction on a substrate; forming second-fins, parallel to and spaced from each other on the substrate, in a same plane as the first fins and in a second direction perpendicular to and crossing the first-fins; forming a dummy gate with a spacer on each side over channel areas of the first and second fins; forming source/drain (S/D) regions at opposite ends of each first and second fin; forming an ILD over the fins and the dummy gate and planarizing to reveal the dummy gate; removing the dummy gate, forming a cavity; and forming a high-k/metal gate in the cavity.
Public/Granted literature
- US20170371002A1 METHODS FOR CROSSED-FINS FINFET DEVICE FOR SENSING AND MEASURING MAGNETIC FIELDS Public/Granted day:2017-12-28
Information query
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