Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method involving a liquid confinement structure
-
Application No.: US15791317Application Date: 2017-10-23
-
Publication No.: US09964861B2Publication Date: 2018-05-08
- Inventor: Jacobus Johannus Leonardus Hendricus Verspay , Hans Jansen , Marco Koert Stavenga
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
Public/Granted literature
- US20180046090A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A LIQUID CONFINEMENT STRUCTURE Public/Granted day:2018-02-15
Information query
IPC分类:
