Invention Grant
- Patent Title: Ultraviolet sensor and method of manufacturing the same
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Application No.: US15613828Application Date: 2017-06-05
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Publication No.: US09966490B1Publication Date: 2018-05-08
- Inventor: Bohr-Ran Huang , Jinn Chu , You-Syuan Chen , Chia-Hao Chang
- Applicant: National Taiwan University of Science and Technology
- Applicant Address: TW Taipei
- Assignee: NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY
- Current Assignee: NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY
- Current Assignee Address: TW Taipei
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: TW106108088A 20170313
- Main IPC: H01L31/108
- IPC: H01L31/108 ; H01L31/0296 ; H01L31/0392 ; H01L31/0352 ; H01L31/0224

Abstract:
An ultraviolet sensor comprises a glass substrate, a semiconductor structure, an electrode layer and a thin film metallic glass. The semiconductor structure comprises a semiconductor seed layer formed on the glass substrate and a plurality of semiconductor nanostructures formed on the semiconductor seed layer. The electrode layer is formed between the semiconductor seed layer and the plurality of semiconductor nanostructures. The thin film metallic glass is in contact with the semiconductor structure, wherein an interface between the thin film metallic glass and the semiconductor structure forms a Schottky barrier junction to inhibit dark current and increase signal-to-noise ratio.
Information query
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