Invention Grant
- Patent Title: Microelectromechanical device and method for manufacturing it
-
Application No.: US15372660Application Date: 2016-12-08
-
Publication No.: US09969607B2Publication Date: 2018-05-15
- Inventor: Heikki Kuisma , Matti Mäntysalo
- Applicant: MURATA MANUFACTURING CO., LTD.
- Applicant Address: JP Nagaokakyo-Shi, Kyoto
- Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee: MURATA MANUFACTURING CO., LTD.
- Current Assignee Address: JP Nagaokakyo-Shi, Kyoto
- Agency: Squire Patton Boggs (US) LLP
- Priority: FI20155948 20151215
- Main IPC: B81B7/00
- IPC: B81B7/00 ; B81C1/00

Abstract:
A device and method utilizes interconnecting layers separated by an insulating layer. A layered structure comprises a first and a second layer of electrically conductive material, and a third layer of electrically insulating material between them. A via trench is fabricated that extends from the second layer through the third layer into the first layer, a surface on the first layer of electrically conductive material forming a bottom surface of the via trench. An ink-jetting set-up for a mixture of liquid carrier and nanoparticles of conductive material is formed, and a specific process period is determined. Capillary flow of nanoparticles to peripheral edges of an ink-jetted blob of said mixture is induced. The mixture is ink-jetted into a blob on the via trench; the layered structure is heated to evaporate the liquid carrier. The interconnection element is higher at a certain point than between opposing side walls.
Public/Granted literature
- US20170166440A1 MICROELECTROMECHANICAL DEVICE AND METHOD FOR MANUFACTURING IT Public/Granted day:2017-06-15
Information query