Invention Grant
- Patent Title: System, apparatus, and method for N/P tuning in a fin-FET
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Application No.: US15582770Application Date: 2017-05-01
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Publication No.: US09978738B2Publication Date: 2018-05-22
- Inventor: Yanxiang Liu , Haining Yang
- Applicant: QUALCOMM Incorporated
- Applicant Address: US CA San Diego
- Assignee: QUALCOMM Incorporated
- Current Assignee: QUALCOMM Incorporated
- Current Assignee Address: US CA San Diego
- Agency: MG-IP Law, P.C.
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L29/78 ; H01L27/092 ; H01L29/66

Abstract:
The n-type to p-type fin-FET strength ratio in an integrated logic circuit may be tuned by the use of cut regions in the active and dummy gate electrodes. In some examples, separate cut regions for the dummy gate electrodes and the active gate electrode may be used to allow for different lengths of gate pass-active regions resulting in appropriately tuned integrated logic circuits.
Public/Granted literature
- US20170236815A1 SYSTEM, APPARATUS, AND METHOD FOR N/P TUNING IN A FIN-FET Public/Granted day:2017-08-17
Information query
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