Invention Grant
- Patent Title: Lithographic system
-
Application No.: US15119100Application Date: 2015-01-23
-
Publication No.: US09989863B2Publication Date: 2018-06-05
- Inventor: Jan Bernard Plechelmus Van Schoot , Andrei Mikhailovich Yakunin
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP14156364 20140224; EP14173121 20140619
- International Application: PCT/EP2015/051352 WO 20150123
- International Announcement: WO2015/124372 WO 20150827
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H05G2/00
Abstract:
A lithographic system including a lithographic apparatus with an anamorphic projection system, and a radiation source configured to generate an EUV radiation emitting plasma at a plasma formation location, the EUV radiation emitting plasma having an elongate form in a plane substantially perpendicular to an optical axis of the radiation source.
Public/Granted literature
- US20170052456A1 LITHOGRAPHIC SYSTEM Public/Granted day:2017-02-23
Information query
IPC分类:
