Invention Grant
- Patent Title: Capacitor and a semiconductor device including the same
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Application No.: US15212299Application Date: 2016-07-18
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Publication No.: US09997591B2Publication Date: 2018-06-12
- Inventor: Jin-su Lee , Gihee Cho , Dongkyun Park , Hyun-Suk Lee , Heesook Park , Jongmyeong Lee
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Samsung-ro, Yeongtong-gu, Suwon-si, Gyeonggi-do
- Agency: Muir Patent Law, PLLC
- Priority: KR10-2015-0127786 20150909
- Main IPC: H01L49/02
- IPC: H01L49/02

Abstract:
A semiconductor device is disclosed. The semiconductor device includes a substrate and capacitor electrically connected to the substrate. The capacitor includes a lower electrode, a dielectric layer disposed on the lower electrode, and an upper electrode disposed on the dielectric layer. The upper electrode includes a first electrode on the dielectric layer and a second electrode on the first electrode, such that the first electrode is disposed between the dielectric layer and the second electrode. The first electrode contains metal oxynitride having a formula of MxOyNz, in which an atomic ratio (y/x) of oxygen (O) to metallic element (M) is a value in the range from 0.5 to 2.
Public/Granted literature
- US20170069711A1 CAPACITOR AND A SEMICONDUCTOR DEVICE INCLUDING THE SAME Public/Granted day:2017-03-09
Information query
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