外观设计
- 专利标题： In-line occluder
-
申请号： US29787842申请日： 2021-06-09
-
公开(公告)号： USD999369S1公开(公告)日： 2023-09-19
- 设计人: David Carballo , Olman Madrigal , J. Ryan Stanfield
- 申请人： ZEVEX, INC.
- 申请人地址： US UT Salt Lake City
- 专利权人： ZEVEX, INC.
- 当前专利权人： ZEVEX, INC.
- 当前专利权人地址： US UT Salt Lake City
- 代理机构： Hodgson Russ LLP
- LOC分类号： 24-02
摘要：
FIG. 1 is a perspective view of an in-line occluder, wherein the in-line occluder is formed of a translucent material;
FIG. 2 is a front elevation view thereof;
FIG. 3 is a rear elevation view thereof;
FIG. 4 is a right side elevation view thereof;
FIG. 5 is a left side elevation view thereof;
FIG. 6 is a top plan view thereof; and,
FIG. 7 is a bottom plan view thereof.
FIG. 2 is a front elevation view thereof;
FIG. 3 is a rear elevation view thereof;
FIG. 4 is a right side elevation view thereof;
FIG. 5 is a left side elevation view thereof;
FIG. 6 is a top plan view thereof; and,
FIG. 7 is a bottom plan view thereof.
信息查询
