再颁专利
USRE38358E1 Cold cathode ion beam deposition apparatus with segregated gas flow
有权
具有分离气流的冷阴极离子束沉积装置
- 专利标题: Cold cathode ion beam deposition apparatus with segregated gas flow
- 专利标题(中): 具有分离气流的冷阴极离子束沉积装置
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申请号: US10267860申请日: 2002-10-10
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公开(公告)号: USRE38358E1公开(公告)日: 2003-12-23
- 发明人: Rudolph Hugo Petrmichl
- 申请人: Rudolph Hugo Petrmichl
- 主分类号: H01J724
- IPC分类号: H01J724
摘要:
A cold cathode closed drift ion source is provided with segregated gas flow. A first gas may be caused to flow through or along a path around a peripheral portion of an anode so as to pass through the electric gap between the anode and cathode. A second gas (different from the first gas) may be caused to flow toward the ion emitting slit, without much of the second gas having to pass through the electric gap(s). If it is desired to utilize a gas which produces insulative material (e.g., an organosilicon gas), this gas may be used as the second gas. Accordingly, insulative material buildup in the electric gap between the anode and cathode may be reduced, and changes in beam chemistry can be achieved without unduly altering ion beam characteristics.
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