再颁专利
- 专利标题: Illumination system particularly for microlithography
- 专利标题(中): 照明系统特别适用于微光刻
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申请号: US11981032申请日: 2001-09-28
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公开(公告)号: USRE42065E1公开(公告)日: 2011-01-25
- 发明人: Martin Antoni , Wolfgang Singer , Johannes Wangler
- 申请人: Martin Antoni , Wolfgang Singer , Johannes Wangler
- 申请人地址: DE Oberkochen
- 专利权人: Carl Zeiss SMT AG
- 当前专利权人: Carl Zeiss SMT AG
- 当前专利权人地址: DE Oberkochen
- 代理机构: Ohlandt, Greeley, Ruggiero & Perle, LLP
- 优先权: DE19819898 19980505; DE19903807 19990202; DE29902108 19990208; WOPCT/EP00/07258 20000728
- 国际申请: PCT/EP01/11233 WO 20010928
- 国际公布: WO02/27400 WO 20020404
- 主分类号: G03B27/42
- IPC分类号: G03B27/42 ; G03B27/54 ; G21K5/00
摘要:
There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed at least partially on a field in the image plane. The second optical component comprises a first optical system that includes at least a third field mirror with positive optical power and a second optical system that includes at least a second field mirror with positive optical power. The first optical system images the plurality of secondary light sources in a plane between the first optical system and the second optical system, forming a plurality of tertiary light sources, and the second optical system images the plurality of tertiary light sources in the exit pupil.