再颁专利
- 专利标题: Projection system for EUV lithography
- 专利标题(中): EUV光刻投影系统
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申请号: US11981511申请日: 2007-10-31
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公开(公告)号: USRE42118E1公开(公告)日: 2011-02-08
- 发明人: Russell Hudyma , Hans-Jûrgen Mann , Udo Dinger
- 申请人: Russell Hudyma , Hans-Jûrgen Mann , Udo Dinger
- 申请人地址: DE Oberkochen
- 专利权人: Carl-Zeiss-SMT AG
- 当前专利权人: Carl-Zeiss-SMT AG
- 当前专利权人地址: DE Oberkochen
- 代理机构: Ohlandt, Greeley, Ruggiero & APerle, LLP
- 优先权: DE19906001 19990215; DE19948240 19991007
- 主分类号: G03B27/54
- IPC分类号: G03B27/54 ; G03B27/42
摘要:
An EUV optical projection system includes at least six reflecting surfaces for imaging an object (OB) on an image (IM). The system is preferably configured to form an intermediate image (IMI) along an optical path from the object (OB) to the image (IM) between a secondary mirror (M2) and a tertiary mirror (M3), such that a primary mirror (M1) and the secondary mirror (M2) form a first optical group (G1) and the tertiary mirror (M3), a fourth mirror (M4), a fifth mirror (M5) and a sixth mirror (M6) form a second optical group (G2). The system also preferably includes an aperture stop (APE) located along the optical path from the object (OB) to the image (IM) between the primary mirror (M1) and the secondary mirror (M2). The secondary mirror (M2) is preferably concave, and the tertiary mirror (M3) is preferably convex. Each of the six reflecting surfaces preferably receives a chief ray (CR) from a central field point at an incidence angle of less than substantially 15°. The system preferably has a numerical aperture greater than 0.18 at the image (IM). The system is preferably configured such that a chief ray (CR) converges toward the optical axis (OA) while propagating between the secondary mirror (M2) and the tertiary mirror (M3).