Invention Application
- Patent Title: POLYCRYSTALLINE SILICON ROD AND PROCESS FOR PREPARING THE SAME
- Patent Title (中): 多晶硅棒及其制备方法
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Application No.: PCT/JP1997001674Application Date: 1997-05-19
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Publication No.: WO1997044277A1Publication Date: 1997-11-27
- Inventor: TOKUYAMA CORPORATION
- Applicant: TOKUYAMA CORPORATION , KUBOTA, Junichi , ODA, Hiroyuki
- Assignee: TOKUYAMA CORPORATION,KUBOTA, Junichi,ODA, Hiroyuki
- Current Assignee: TOKUYAMA CORPORATION,KUBOTA, Junichi,ODA, Hiroyuki
- Priority: JP8/125313 19960521
- Main IPC: C01B33/02
- IPC: C01B33/02
Abstract:
A polycrystalline silicon rod characterized by having a half value width of the X-ray diffraction pattern peak showing a crystal orientation (111) of not more than 0.3 DEG , an internal distortion factor in the radial direction of less than 5.0 x 10 cm , and an internal iron concentration of not more than 0.5 ppba. Such a high-crystallinity, high-purity and low-internal distortion polycrystalline silicon rod is prepared by heating a silicon core material in a gaseous atmosphere comprising trichlorosilane and hydrogen to deposit silicon onto the silicon core material to prepare a polycrystalline silicon rod and then heat treating the rod out of contact with the open air to reduce an inherent strain.
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