Invention Application
WO9952964A3 NANOSTRUCTURED FORMS AND LAYERS AND METHOD FOR PRODUCING THEM USING STABLE WATER-SOLUBLE PRECURSORS
审中-公开
纳米结构化的形式身体和层和稳定的水溶性前体的生产
- Patent Title: NANOSTRUCTURED FORMS AND LAYERS AND METHOD FOR PRODUCING THEM USING STABLE WATER-SOLUBLE PRECURSORS
- Patent Title (中): 纳米结构化的形式身体和层和稳定的水溶性前体的生产
-
Application No.: PCT/EP9902396Application Date: 1999-04-08
-
Publication No.: WO9952964A3Publication Date: 2000-01-20
- Inventor: ARPAC ERTUGRUL , JONSCHKER GERHARD , SCHIRRA HERMANN , SCHMIDT HELMUT
- Applicant: INST NEUE MAT GEMEIN GMBH , ARPAC ERTUGRUL , JONSCHKER GERHARD , SCHIRRA HERMANN , SCHMIDT HELMUT
- Assignee: INST NEUE MAT GEMEIN GMBH,ARPAC ERTUGRUL,JONSCHKER GERHARD,SCHIRRA HERMANN,SCHMIDT HELMUT
- Current Assignee: INST NEUE MAT GEMEIN GMBH,ARPAC ERTUGRUL,JONSCHKER GERHARD,SCHIRRA HERMANN,SCHMIDT HELMUT
- Priority: DE19816136 1998-04-09
- Main IPC: C08K3/36
- IPC: C08K3/36 ; C03C1/00 ; C03C14/00 ; C03C17/00 ; C08G77/14 ; C08G77/20 ; C08G77/58 ; C08L83/04 ; C09D4/00 ; C09D183/04 ; C09D183/07
Abstract:
The invention relates to a method for producing a composition for preparing nanostructured forms and layers, consisting of bringing an aqueous and/or alcoholic sol of a compound of an element selected from silicon and the main and sub-group metals into contact with species which have hydrolyzable alkoxy groups and which include at least one organically modified alkoxysilane or a precondensate derived therefrom, in conditions which lead to the (further) hydrolysis of the species and then removing any alcohol which has formed or which may optionally have been present originally. The invention is characterized in that enough alcohol is removed to leave a residual amount of not more than 20 wt.% in the composition.
Information query
